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Critical Dimension Scanning Electron Microscope (CD-SEM) recipe creation needs sample
preparation necessary for matching pattern registration, and recipe creation on CD-SEM using the
sample, which hinders the reduction in test production cost and time in semiconductor
manufacturing factories. From the perspective of cost reduction and improvement of the test
production efficiency, automated CD-SEM recipe creation without the sample preparation and the
manual operation has been important in the production lines. For the automated CD-SEM recipe
creation, we have introduced RecipeDirector (RD) that enables the recipe creation by using
Computer-Aided Design (CAD) data and text data that includes measurement information. We have
developed a system that automatically creates the CAD data and the text data necessary for the
recipe creation on RD; and, for the elimination of the manual operation, we have enhanced RD so
that all measurement information can be specified in the text data. As a result, we have established
an automated CD-SEM recipe creation system without the sample preparation and the manual
operation. For the introduction of the CD-SEM recipe creation system using RD to the production
lines, the accuracy of the pattern matching was an issue. The shape of design templates for the
matching created from the CAD data was different from that of SEM images in vision. Thus, a
development of robust pattern matching algorithm that considers the shape difference was needed.
The addition of image processing of the templates for the matching and shape processing of the CAD
patterns in the lower layer has enabled the robust pattern matching.
This paper describes the automated CD-SEM recipe creation technology for the production lines
without the sample preparation and the manual operation using RD applied in Sony Semiconductor
Kyusyu Corporation Kumamoto Technology Center (SCK Corporation Kumamoto TEC).
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