EUV underlayer materials for 22nm HP and beyond

Huirong Yao; Zachary Bogusz; Jianhui Shan; Joonyeon Cho; Salem Mullen; Guanyang Lin; Mark Neisser

doi:10.1117/12.881639

15 April 2011 EUV underlayer materials for 22nm HP and beyond

Huirong Yao, Zachary Bogusz, Jianhui Shan, Joonyeon Cho, Salem Mullen, Guanyang Lin, Mark Neisser

Proceedings Volume 7972, Advances in Resist Materials and Processing Technology XXVIII; 797212 (2011) https://doi.org/10.1117/12.881639
Event: SPIE Advanced Lithography, 2011, San Jose, California, United States

Abstract

EUV lithography is expected to be an important technology for manufacturing 22 nm node and beyond in the semiconductor industry. To achieve the desired resist RLS performance for such fine feature patterns, multilayer materials are almost certainly needed to define the overall lithography process. The resist modeling and experiment studies suggest high EUV absorbance of the film improves resolution, line width roughness and sensitivity. In this paper, we report the studies of new EUV underlayers (EBL) based on crosslinkable organic underlayer materials with high EUV photon absorption (EPA) unit. The lithography results for the new EUV underlayer materials have demonstrated advantages over conventional organic underlayer in terms of resist sensitivity, resolution, process window, pattern profile, collapse margin, and possibly line width roughness.

Citation Download Citation

Huirong Yao, Zachary Bogusz, Jianhui Shan, Joonyeon Cho, Salem Mullen, Guanyang Lin, and Mark Neisser "EUV underlayer materials for 22nm HP and beyond", Proc. SPIE 7972, Advances in Resist Materials and Processing Technology XXVIII, 797212 (15 April 2011); https://doi.org/10.1117/12.881639

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available