Development of molecular resists based on Phenyl[4]calixarene for EBL

Masaaki Takasuka; Yu Okada; Hiromi Hayashi; Masatoshi Echigo

doi:10.1117/12.879122

15 April 2011 Development of molecular resists based on Phenyl[4]calixarene for EBL

Masaaki Takasuka, Yu Okada, Hiromi Hayashi, Masatoshi Echigo

Proceedings Volume 7972, Advances in Resist Materials and Processing Technology XXVIII; 797223 (2011) https://doi.org/10.1117/12.879122
Event: SPIE Advanced Lithography, 2011, San Jose, California, United States

Abstract

In this paper, we report current performance of the negative-tone molecular resists based on calix[4]resorcinarene (CRA) by Electron Beam Lithography (EBL). We have developed hydroxyphenyl calix[4]resorcinarenes (H-CRAs) designed hydroxy-groups outer to adhere patterns to wafers. Hydroxy groups help patterns adhere to wafers, to restrain collapse of patterns. Moreover, we additionally controlled hydrophobicity of H-CRA by the alkyl-groups (R), which make the sensitivity higher. The negative-tone resist based on these H-CRAs shows well-defined 25-50nm half-pitch patterns, and the increase in hydrophobicity of H-CRA by the alkyl-groups (R) made the high sensitivity. Furthermore, the optimization of these resist formulation improved sensitivity and LER.

Citation Download Citation

Masaaki Takasuka, Yu Okada, Hiromi Hayashi, and Masatoshi Echigo "Development of molecular resists based on Phenyl[4]calixarene for EBL", Proc. SPIE 7972, Advances in Resist Materials and Processing Technology XXVIII, 797223 (15 April 2011); https://doi.org/10.1117/12.879122

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