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15 April 2011 Characterization of filter performance on contact-hole defectivity
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The effect of filtration on defectivity has been studied extensively with line-space patterns. However, the ability to have defect free contacts is equally as important. Resist materials are specifically designed for contact holes, and therefore it is important to also study their varied sources of defectivity. In this study, unpatterned and patterned wafer defectivities have been studied as a function of point of use filter. The filter retention rating was held constant at 10 nm while the filter membrane material was varied, including ultra-high molecular weight polyethylene (UPE), Nylon and composite filters. A recommendation will be made as to which point-of-use filter performed best with the contact hole specific resists tested.
© (2011) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
J. Braggin, N. Vitorino, V. Monreal, and J. Zook "Characterization of filter performance on contact-hole defectivity", Proc. SPIE 7972, Advances in Resist Materials and Processing Technology XXVIII, 79722Y (15 April 2011);

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