Improved fab CDU with FlexRay and LithoTuner

Robert Socha; Wenjin Shao; Xu Xie; Youri van Dommelen; Dorothe Oorschot; Henry Megens; Venu Vellanki

doi:10.1117/12.879619

22 March 2011 Improved fab CDU with FlexRay and LithoTuner

Robert Socha, Wenjin Shao, Xu Xie, Youri van Dommelen, Dorothe Oorschot, Henry Megens, Venu Vellanki

Proceedings Volume 7973, Optical Microlithography XXIV; 79730Q (2011) https://doi.org/10.1117/12.879619
Event: SPIE Advanced Lithography, 2011, San Jose, California, United States

Abstract

FlexRay programmable illumination and LithoTuner software is combined in several use cases. The first use case is optical proximity error (OPE) minimization. Simulation predicts the rms OPE error is reduced by 39% with LithoTuner and FlexRay, and is confirmed via experiment with a reduction of 33%. For minimizing the OPE error, two types of illumination tuning was performed, sigma tuning and freeform tuning. The sigma tuning is able to reduce the mean-totarget critical dimension (CD) error, but the CD error variance is unaffected. Freeform tuning, however, is able to reduce both the mean-to-target CD and the CD error variance. The second use case is matching two ArF scanners, a XT:1950Hi with FlexRay to a XT:1700Fi with diffractive optical element (DOE) illumination. With LithoTuner and FlexRay, simulation predicts the CD error post-matching is reduced by 51%, and experiment was able to achieve a reduction of 29%.

Citation Download Citation

Robert Socha, Wenjin Shao, Xu Xie, Youri van Dommelen, Dorothe Oorschot, Henry Megens, and Venu Vellanki "Improved fab CDU with FlexRay and LithoTuner", Proc. SPIE 7973, Optical Microlithography XXIV, 79730Q (22 March 2011); https://doi.org/10.1117/12.879619

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