The study of wavelength interval between adjacent ONUs in OFDMA-PON

Xiaoting Xie; Yaojun Qiao; Yuefeng Ji

doi:10.1117/12.888923

18 February 2011 The study of wavelength interval between adjacent ONUs in OFDMA-PON

Xiaoting Xie, Yaojun Qiao, Yuefeng Ji

Proceedings Volume 7988, Optical Transmission Systems, Switching, and Subsystems VIII; 79881B (2011) https://doi.org/10.1117/12.888923
Event: Asia Communications and Photonics Conference and Exhibition, 2010, Shanghai, Shanghai, China

Abstract

OFDMA-PON is an attractive candidate for the next-generation PON. We study the influence of wavelength interval between adjacent ONUs in OFDMA-PON by simulation and theoretical analysis, and find the minimum wavelength intervals which are different in ideal and actual system. The ideal minimum wavelength interval is twice of OFDM symbol bandwidth, while actual minimum interval is larger than that.

Citation Download Citation

Xiaoting Xie, Yaojun Qiao, and Yuefeng Ji "The study of wavelength interval between adjacent ONUs in OFDMA-PON", Proc. SPIE 7988, Optical Transmission Systems, Switching, and Subsystems VIII, 79881B (18 February 2011); https://doi.org/10.1117/12.888923

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