Effect of silica doping on the stability of gasochromic films

Jiandong Wu; Guangming Wu; Guohua Gao; Zenghai Zhang; Wei Feng; Jun Shen; Zhihua Zhang

doi:10.1117/12.888323

18 February 2011 Effect of silica doping on the stability of gasochromic films

Jiandong Wu, Guangming Wu, Guohua Gao, Zenghai Zhang, Wei Feng, Jun Shen, Zhihua Zhang

Proceedings Volume 7995, Seventh International Conference on Thin Film Physics and Applications; 79950F (2011) https://doi.org/10.1117/12.888323
Event: Seventh International Conference on Thin Film Physics and Applications, 2010, Shanghai, China

Abstract

WO₃ has emerged as one of the most extensively studied materials because its gasochromic effect can be used for smart window and gas sensor; currently it is widely used in many energy conservation areas. Compared with other preparations methods for gasoschromic films, sol-gel process shows several advantages, such as low cost and large-scale applications. However, sol-gel WO₃ films were not stable enough for commercial application yet. In this paper, we first investigated the effect of SiO₂ doping, which exhibited good enhancement of WO₃ gasochromic films' stability. We also examined the relationship between SiO₂ ratio and stability of WO₃/SiO₂ films. An empirical formula was established by fitting exponential decay of the coloring-bleaching cycles for four different Si/W ratios.

Citation Download Citation

Jiandong Wu, Guangming Wu, Guohua Gao, Zenghai Zhang, Wei Feng, Jun Shen, and Zhihua Zhang "Effect of silica doping on the stability of gasochromic films", Proc. SPIE 7995, Seventh International Conference on Thin Film Physics and Applications, 79950F (18 February 2011); https://doi.org/10.1117/12.888323

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