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We describe some destructive and non-destructive techniques that can be useful to examine multilayers and particularly
their interfaces. The presented non-destructive techniques allow obtaining the electron structure of the sample and then
determine the chemical states of the elements in the multilayer from the analysis of the occupied (x-ray emission and
photoemission spectroscopies) or unoccupied (x-ray absorption or electron energy loss spectroscopies) states. Among the
destructive techniques we introduce secondary ion mass spectrometry and transmission electron microscopy that bring
some information about the structural quality of the samples.
P. Jonnard
"Some techniques to characterize multilayers and their interfaces", Proc. SPIE 7995, Seventh International Conference on Thin Film Physics and Applications, 79951T (18 February 2011); https://doi.org/10.1117/12.888172
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P. Jonnard, "Some techniques to characterize multilayers and their interfaces," Proc. SPIE 7995, Seventh International Conference on Thin Film Physics and Applications, 79951T (18 February 2011); https://doi.org/10.1117/12.888172