Paper
8 December 2011 Information extraction from laser speckle patterns using wavelet entropy techniques
Xijun Wang, Xinzhong Li, Shaochang Su
Author Affiliations +
Proceedings Volume 8002, MIPPR 2011: Multispectral Image Acquisition, Processing, and Analysis; 80021J (2011) https://doi.org/10.1117/12.902103
Event: Seventh International Symposium on Multispectral Image Processing and Pattern Recognition (MIPPR2011), 2011, Guilin, China
Abstract
A novel speckle patterns processing method is presented using multi-scale wavelet techniques. Laser speckle patterns generated from the sample contained abundant information. In this paper, we propose a method using wavelet entropy techniques to analyze the speckle patterns and exact the information on the sample surface. In our case, we used this approach to test the solar silicon cell surface profiles based on the sym8 orthogonal wavelet family. According different wavelet entropy values, the micro-structure of different solar silicon cell surfaces were comparative analyzed. Furthermore, we studied the AFM and reflective spectra of the wafer. Results show that the wavelet entropy speckle processing method is effective and accurate. And the experiment proved that this method is a useful tool to investigate the surface profile quality.
© (2011) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Xijun Wang, Xinzhong Li, and Shaochang Su "Information extraction from laser speckle patterns using wavelet entropy techniques", Proc. SPIE 8002, MIPPR 2011: Multispectral Image Acquisition, Processing, and Analysis, 80021J (8 December 2011); https://doi.org/10.1117/12.902103
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Wavelets

Speckle pattern

Reflectivity

Semiconducting wafers

Speckle

Silicon

Wavelet transforms

Back to Top