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21 October 2011 Laser ablated glass microlens arrays: aberrations dependence on reflowing temperature
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Abstract
The Laser-direct writing technique combined with a reflowing thermal treatment has demonstrated its capability to provide microlens array with small diameter and good focusing capabilities. In this paper we analyze the influence of the thermal treatment at temperatures of 650°C, 660°C, and 670°C, on the optical aberrations of the manufactured glass microlens arrays by ablation with a Nd:YVO4 laser. We observed that by increasing the reflowing temperature we reduce the microlenses optical aberrations and increase the resemblance between microlenses. In particular at 670°C we obtain high quality microlens arrays characterized with a root mean square aberration of λ/28 ± λ/77, strehl ratio of 0.9475±0.0352 and depth of focus of 16.438± 5.762 μm. Our results show the reliability of the combination of the Laser-direct writing technique with thermal treatment for fabricating high quality microlens arrays.
© (2011) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
J. Arines, D. Nieto, M. T. Flores-Arias, C. Gómez-Reino, and Gerard M. O'Connor "Laser ablated glass microlens arrays: aberrations dependence on reflowing temperature", Proc. SPIE 8011, 22nd Congress of the International Commission for Optics: Light for the Development of the World, 801105 (21 October 2011); https://doi.org/10.1117/12.900767
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