Direct-write scanning probe lithography: towards a desktop fab

Louise R. Giam; Andrew J. Senesi; Xing Liao; Lu Shin Wong; Jinan Chai; Daniel J. Eichelsdoerfer; Wooyoung Shim; Boris Rasin; Shu He; Chad A. Mirkin

doi:10.1117/12.884665

13 May 2011 Direct-write scanning probe lithography: towards a desktop fab

Louise R. Giam, Andrew J. Senesi, Xing Liao, Lu Shin Wong, Jinan Chai, Daniel J. Eichelsdoerfer, Wooyoung Shim, Boris Rasin, Shu He, Chad A. Mirkin

Author Affiliations +

Proceedings Volume 8031, Micro- and Nanotechnology Sensors, Systems, and Applications III; 803103 (2011) https://doi.org/10.1117/12.884665
Event: SPIE Defense, Security, and Sensing, 2011, Orlando, Florida, United States

Abstract

Massively parallel scanning-probe based methods have been used to address the challenges of nanometer to millimeter scale printing for a variety of materials and mark a step towards the realization of a "desktop fab." Such tools enable simple, flexible, high-throughput, and low-cost nano- and microscale patterning, which allow researchers to rapidly synthesize and study systems ranging from nanoparticle synthesis to biological processes. We have developed a novel scanning probe-based cantilever-free printing method termed polymer pen lithography (PPL), which uses an array of elastomeric tips to transfer materials (e.g. alkanethiols, proteins, polymers) in a direct-write manner onto a variety of surfaces. This technique takes the best attributes of dip-pen nanolithography (DPN) and eliminates many of the disadvantages of contact printing. Various related techniques such as beam pen lithography (BPL), scanning probe block copolymer lithography (SPBCL), and hard-tip, soft spring lithography (HSL) are also discussed.

Citation Download Citation

Louise R. Giam, Andrew J. Senesi, Xing Liao, Lu Shin Wong, Jinan Chai, Daniel J. Eichelsdoerfer, Wooyoung Shim, Boris Rasin, Shu He, and Chad A. Mirkin "Direct-write scanning probe lithography: towards a desktop fab", Proc. SPIE 8031, Micro- and Nanotechnology Sensors, Systems, and Applications III, 803103 (13 May 2011); https://doi.org/10.1117/12.884665

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