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3 May 2011Synthesis of patterned freestanding nickel nanowires by using ion
track-etched polyimide
Nowadays, a lot of applications including nanoelectronics, spintronics or miniaturized sensors are using nanowires.
Unfortunately, current techniques used for local synthesis of nanowires are still not fully compatible with common
microfabrication techniques. In this study, we focus on the synthesis of patterned metallic nanowires by
electrodeposition within nanoporous polyimide membranes integrated on 3 inch Si bulk wafers. Known to have a high
planarization factor, a good resistance to most non-oxidizing acids and bases and to be CMOS compatible, polyimide is
increasingly used in microsystems. Furthermore, like polycarbonate or polyester, nanoporous polyimide can be obtained
by ion track-etching process. This polymer shows then a great interest to be used as a mold for nanowires growth.
Patterned freestanding Nickel nanowires have been synthesized over a 100 nm thickness gold layer evaporated onto a
SiO2/Si substrate, with diameters of 20 and 60 nm, and length between 2 and 2.5 μm, depending on the electrodeposition
time. Such fabrication process is promising to achieve more complex microelectromechanical systems incorporating
nanostructures.
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T. Walewyns, G. Scheen, E. Tooten, L. A. Francis, "Synthesis of patterned freestanding nickel nanowires by using ion track-etched polyimide," Proc. SPIE 8068, Bioelectronics, Biomedical, and Bioinspired Systems V; and Nanotechnology V, 806815 (3 May 2011); https://doi.org/10.1117/12.886775