Manufacturing and characterization of diffraction quality normal incidence optics for the XEUV range

N. I. Chkhalo; M. M. Barysheva; A. E. Pestov; N. N. Salashchenko; M. N. Toropov

doi:10.1117/12.886479

4 May 2011 Manufacturing and characterization of diffraction quality normal incidence optics for the XEUV range

N. I. Chkhalo, M. M. Barysheva, A. E. Pestov, N. N. Salashchenko, M. N. Toropov

Proceedings Volume 8076, EUV and X-Ray Optics: Synergy between Laboratory and Space II; 80760P (2011) https://doi.org/10.1117/12.886479
Event: SPIE Optics + Optoelectronics, 2011, Prague, Czech Republic

Abstract

Due to recent progress in short-period multilayer mirrors manufacturing, a real opportunity of nanoscale space resolution imaging in the XEUV range is appeared. Traditional manufacturing and surface shape characterization techniques do not meet the requirements. This paper reports on some new methods and technologies of measurement and surface shape correction, developed in IPM RAS. Last experimental results in manufacturing and surface shape studies of spherical and aspherical mirrors and objectives for X-ray optics are presented, as well as reflection characteristics of normal incidence multilayer mirrors made in IPM RAS. The advantages of using the multilayer optical elements for the diffraction quality imaging in comparing with Frenel's zone plates are discussed. There are also proposed some new applications for multilayer-based reflecting optical elements.

Citation Download Citation

N. I. Chkhalo, M. M. Barysheva, A. E. Pestov, N. N. Salashchenko, and M. N. Toropov "Manufacturing and characterization of diffraction quality normal incidence optics for the XEUV range", Proc. SPIE 8076, EUV and X-Ray Optics: Synergy between Laboratory and Space II, 80760P (4 May 2011); https://doi.org/10.1117/12.886479

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