Paper
23 September 2011 Advanced holographic methods in extreme ultraviolet interference lithography
Bernd Terhalle, Andreas Langner, Birgit Päivänranta, Yasin Ekinci
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Abstract
We study the formation of complex pattern geometries and beam shapes in diffraction-based extreme ultraviolet interference lithography. In particular, we demonstrate numerically as well as experimentally the potential of interfering multiple beams with well-controlled relative phase relations for the fabrication of high resolution periodic and quasiperiodic nanostructures.
© (2011) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Bernd Terhalle, Andreas Langner, Birgit Päivänranta, and Yasin Ekinci "Advanced holographic methods in extreme ultraviolet interference lithography", Proc. SPIE 8102, Nanoengineering: Fabrication, Properties, Optics, and Devices VIII, 81020V (23 September 2011); https://doi.org/10.1117/12.893733
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CITATIONS
Cited by 10 scholarly publications and 2 patents.
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KEYWORDS
Extreme ultraviolet

Photomasks

Diffraction gratings

Lithography

Nanostructures

Computer simulations

Diffraction

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