Paper
13 September 2011 Application of nanostructured silicon to manufacturing of solar cells
Angelika I. Luchenko, Tetyana Bilyk, Mykola M. Melnichenko, Olexandra M. Shmyryeva, Kateryna Svezhentsova
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Abstract
In the paper the process of controlled formation of nanostructured silicon is demonstrated and the optical performance compared to standard and textured interfaces. The influence of the formation technique type on its structure, photoluminescent and anti-reflecting properties is studied. The layers of nanostructured silicon have been formed on the textured surface of solar cells. It has been demonstrated that the use of nanostructured silicon reduces the anti-reflection coefficient significantly. It is also shown, that the formation of nanostructured silicon on a textured substrate of singlecrystal silicon after formation on them of contact systems results in decrease of consecutive resistance, increase of short circuit current, decrease of shunting resistance and increase of efficiency.
© (2011) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Angelika I. Luchenko, Tetyana Bilyk, Mykola M. Melnichenko, Olexandra M. Shmyryeva, and Kateryna Svezhentsova "Application of nanostructured silicon to manufacturing of solar cells", Proc. SPIE 8110, Thin Film Solar Technology III, 81100L (13 September 2011); https://doi.org/10.1117/12.895315
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KEYWORDS
Silicon

Nanostructuring

Etching

Reflection

Solar cells

Resistance

Antireflective coatings

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