New x-ray nanofocusing devices based on total-reflection zone plates

H. Takano; T. Tsuji; Y. Kagoshima

doi:10.1117/12.892678

28 September 2011 New x-ray nanofocusing devices based on total-reflection zone plates

H. Takano, T. Tsuji, Y. Kagoshima

Proceedings Volume 8139, Advances in X-Ray/EUV Optics and Components VI; 81390D (2011) https://doi.org/10.1117/12.892678
Event: SPIE Optical Engineering + Applications, 2011, San Diego, California, United States

Abstract

X-ray nanofocusing devices are capable of focusing X-rays down to sizes of about 10 nm. We have developed a new nanofocusing device, known as total-reflection zone plates (TRZPs), for focusing high-brilliance synchrotron radiation in the hard x-ray region. This device consists of a reflective zone pattern on a flat substrate. It has the potential to focus hard x-rays down to sub-10-nm dimensions. Furthermore, it is considerably easier to fabricate than other hard x-ray nanofocusing devices since it is used with a very small grazing incidence angle. We have focused 10-keV x-rays to sub-15 nm dimensions using a TRZP that was fabricated by conventional electron-beam lithography. In addition, we present designs for more efficient devices that have a target focus size of 5 nm. We propose and discuss a new approach for achieving point focusing with nanometer dimensions.

Citation Download Citation

H. Takano, T. Tsuji, and Y. Kagoshima "New x-ray nanofocusing devices based on total-reflection zone plates", Proc. SPIE 8139, Advances in X-Ray/EUV Optics and Components VI, 81390D (28 September 2011); https://doi.org/10.1117/12.892678

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