Characterization of the temporal duration of the XUV laser pulse at the LASERIX facility

L. Meng; A.-C. Bourgaux; S. Bastiani-Ceccotti; O. Guilbaud; M. Pittman; S. Kazamias; K. Cassou; S. Daboussi; D. Ros; A. Klisnick

doi:10.1117/12.894636

5 October 2011 Characterization of the temporal duration of the XUV laser pulse at the LASERIX facility

L. Meng, A.-C. Bourgaux, S. Bastiani-Ceccotti, O. Guilbaud, M. Pittman, S. Kazamias, K. Cassou, S. Daboussi, D. Ros, A. Klisnick

Author Affiliations +

Proceedings Volume 8140, X-ray Lasers and Coherent X-ray Sources: Development and Applications IX; 81401A (2011) https://doi.org/10.1117/12.894636
Event: SPIE Optical Engineering + Applications, 2011, San Diego, California, United States

Abstract

We report recent experimental measurements of the duration of a Ni-like Mo transient XUV laser emitted at 18.9 nm and generated under GRIP geometry at the LASERIX facility. These measurements have been performed using an ultra-fast X-ray streak camera (AXIS Photonique). A new trigger line was implemented, yielding a shot-to-shot jitter of less than 10 ps. The KBr photocathode of the streak camera was positioned close to the plane of the magnified near-field image of the XUV laser emitting aperture. Saturation in the streak camera was avoided by carefully adjusting the signal level of the focused image. The sweep speed was calibrated in-situ by generating a double-pulse XUV laser. Finally the temporal resolution of the instrument was measured directly with a femtosecond, high-order harmonic pulse. XUV laser pulse durations as short as 2.8 ps were measured for a 20° GRIP angle and a 0.75 ps GRIP pulse duration. We present and discuss our study of the effect of these two parameters on the measured pulse duration.

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L. Meng, A.-C. Bourgaux, S. Bastiani-Ceccotti, O. Guilbaud, M. Pittman, S. Kazamias, K. Cassou, S. Daboussi, D. Ros, and A. Klisnick "Characterization of the temporal duration of the XUV laser pulse at the LASERIX facility", Proc. SPIE 8140, X-ray Lasers and Coherent X-ray Sources: Development and Applications IX, 81401A (5 October 2011); https://doi.org/10.1117/12.894636

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