Towards interferometric quantum lithography: observation of spatial quantum interference of the three-photon N00N state

Yong-Su Kim; Osung Kwon; Sang Min Lee; Heonoh Kim; Sang-Kyung Choi; Hee Su Park; Yoon-Ho Kim

doi:10.1117/12.903886

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6 September 2011 Towards interferometric quantum lithography: observation of spatial quantum interference of the three-photon N00N state

Yong-Su Kim, Osung Kwon, Sang Min Lee, Heonoh Kim, Sang-Kyung Choi, Hee Su Park, Yoon-Ho Kim

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Proceedings Volume 8163, Quantum Communications and Quantum Imaging IX; 816314 (2011) https://doi.org/10.1117/12.903886
Event: SPIE Optical Engineering + Applications, 2011, San Diego, California, United States

Abstract

Spatial interference of quantum mechanical particles exhibits a fundamental feature of quantum mechanics. A two-mode entangled state of N particles known as N00N state can give rise to non-classical interference. We report the first experimental observation of a three-photon N00N state exhibiting Young's double-slit type spatial quantum interference. Compared to a single-photon state, the three-photon entangled state generates interference fringes that are three times denser. Moreover, its interference visibility of 0.49 ± 0.09 is well above the limit of 0.1 for spatial super-resolution of classical origin. The demonstration of spatial quantum interference by a N00N state composed of more than two photons represents an important step towards applying quantum entanglement to technologies such as lithography and imaging.

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Yong-Su Kim, Osung Kwon, Sang Min Lee, Heonoh Kim, Sang-Kyung Choi, Hee Su Park, and Yoon-Ho Kim "Towards interferometric quantum lithography: observation of spatial quantum interference of the three-photon N00N state", Proc. SPIE 8163, Quantum Communications and Quantum Imaging IX, 816314 (6 September 2011); https://doi.org/10.1117/12.903886

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