EQ-10 electrodeless Z-pinch EUV source for metrology applications

Deborah Gustafson; Stephen F. Horne; Matthew J. Partlow; Matthew M. Besen; Donald K. Smith; Paul A. Blackborow

doi:10.1117/12.899141

13 October 2011 EQ-10 electrodeless Z-pinch EUV source for metrology applications

Deborah Gustafson, Stephen F. Horne, Matthew J. Partlow, Matthew M. Besen, Donald K. Smith, Paul A. Blackborow

Proceedings Volume 8166, Photomask Technology 2011; 81662U (2011) https://doi.org/10.1117/12.899141
Event: SPIE Photomask Technology, 2011, Monterey, California, United States

Abstract

With EUV Lithography systems shipping, the requirements for highly reliable EUV sources for mask inspection and resist outgassing are becoming better defined, and more urgent. The sources needed for metrology applications are very different than that needed for lithography; brightness (not power) is the key requirement. Suppliers for HVM EUV sources have all resources working on high power and have not entered the smaller market for metrology. Energetiq Technology has been shipping the EQ-10 Electrodeless Z-pinch^TM light source since 19951. The source is currently being used for metrology, mask inspection, and resist development2-4. These applications require especially stable performance in both output power and plasma size and position. Over the last 6 years Energetiq has made many source modifications which have included better thermal management to increase the brightness and power of the source. We now have introduced a new source that will meet requirements of some of the mask metrology first generation tools; this source will be reviewed.

Citation Download Citation

Deborah Gustafson, Stephen F. Horne, Matthew J. Partlow, Matthew M. Besen, Donald K. Smith, and Paul A. Blackborow "EQ-10 electrodeless Z-pinch EUV source for metrology applications", Proc. SPIE 8166, Photomask Technology 2011, 81662U (13 October 2011); https://doi.org/10.1117/12.899141

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members: $17.00

Non-members: $21.00 ADD TO CART

PROCEEDINGS
14 PAGES

DOWNLOAD PAPER SAVE TO MY LIBRARY

GET CITATION

RIGHTS & PERMISSIONS

Get copyright permission Get copyright permission on Copyright Marketplace

KEYWORDS

Plasma

Extreme ultraviolet

Metrology

Modulators

Photomasks

Inspection

Light sources

Show All Keywords

Keywords/Phrases

Search In:

Publication Years