In-die mask registration measurement with existing inspection tools

Shuichi Tamamushi; Takanao Touya

doi:10.1117/12.898890

13 October 2011 In-die mask registration measurement with existing inspection tools

Shuichi Tamamushi, Takanao Touya

Author Affiliations +

Proceedings Volume 8166, Photomask Technology 2011; 816639 (2011) https://doi.org/10.1117/12.898890
Event: SPIE Photomask Technology, 2011, Monterey, California, United States

Abstract

The demand for aggressive image placement accuracy for each generation is being increasingly accelerated by DPT deployment. The method of the correction with the scanner is in effect devised by obtaining the CD and IP maps of each mask after the mask pattern is drawn, We are developing a technology that generates CD and IP maps for each mask from the image data of inspection equipment with the ultimate goal of "in-die overlay improvement" optimizing scanner as well as writer performances. We have reported in-die CD and registration metrology capability of mask inspection equipment. However existing inspection machines, which are already in use, do not have such features to perform this function, as they are not designed for such purpose. We are developing a method to improve measurement accuracy by incorporating registration mark data obtained by conventional metrology tool, and will report the result of evaluation of this method.

Citation Download Citation

Shuichi Tamamushi and Takanao Touya "In-die mask registration measurement with existing inspection tools", Proc. SPIE 8166, Photomask Technology 2011, 816639 (13 October 2011); https://doi.org/10.1117/12.898890

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