Releasing material screening and continuous nano-imprinting in mold replication for nano-imprint lithography

Kouta Suzuki; Hideo Kobayashi; Takashi Sato; Hiroshi Yamashita; Tsuyoshi Watanabe

doi:10.1117/12.897099

13 October 2011 Releasing material screening and continuous nano-imprinting in mold replication for nano-imprint lithography

Kouta Suzuki, Hideo Kobayashi, Takashi Sato, Hiroshi Yamashita, Tsuyoshi Watanabe

Author Affiliations +

Proceedings Volume 8166, Photomask Technology 2011; 81663B (2011) https://doi.org/10.1117/12.897099
Event: SPIE Photomask Technology, 2011, Monterey, California, United States

Abstract

Nano-Imprint Lithography and a mold, mold replication from an EB master mold as well, those are essential for a large-scale production of patterned media. In nano-imprinting, since it is contact printing, a higher separation force might cause damages to the master and imprinting tool, degradation in pattern quality as well. Those difficulties also work to retard continuous imprinting for the mold replication. Then, we focused on release materials characterization and selection to facilitate clean separation between cured resist and the master. This paper describes a novel release material, and continuous nano-imprinting results with it for replica mold fabrication from an EB master for the patterned media application.

Citation Download Citation

Kouta Suzuki, Hideo Kobayashi, Takashi Sato, Hiroshi Yamashita, and Tsuyoshi Watanabe "Releasing material screening and continuous nano-imprinting in mold replication for nano-imprint lithography", Proc. SPIE 8166, Photomask Technology 2011, 81663B (13 October 2011); https://doi.org/10.1117/12.897099

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