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30 September 2011 Optical system to extract reflection coefficients and optical admittances of a thin film stack and its application in coating monitoring
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Abstract
An optical system to extract the reflection coefficient and optical admittance of film stack is presented. Both reflection phase and reflection magnitude intensity from the tested film stack were measured under normal incidence of the light. Two dimensional refractive index and thickness distribution of each layer in multilayer thin films can be obtained by the analysis of the reflection coefficients or optical admittance of multi-wavelengths. A novel monitoring method for the thin film deposition using the reflection coefficient and optical admittance loci as the thickness grows is also proposed to achieve better performance in this article.
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Cheng-Chung Lee, Kai Wu, Yu-Jen Chen, and Chien-Cheng Kuo "Optical system to extract reflection coefficients and optical admittances of a thin film stack and its application in coating monitoring", Proc. SPIE 8172, Optical Complex Systems: OCS11, 81721D (30 September 2011); https://doi.org/10.1117/12.898963
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