Measurement and calculation of ternary oxide mixtures for thin films for ultra short pulse laser optics

M. Jupé; M. Mende; C. Kolleck; D. Ristau; L. Gallais; B. Mangote

doi:10.1117/12.899566

22 November 2011 Measurement and calculation of ternary oxide mixtures for thin films for ultra short pulse laser optics

M. Jupé, M. Mende, C. Kolleck, D. Ristau, L. Gallais, B. Mangote

Author Affiliations +

Proceedings Volume 8190, Laser-Induced Damage in Optical Materials: 2011; 819004 (2011) https://doi.org/10.1117/12.899566
Event: SPIE Laser Damage, 2011, Boulder, Colorado, United States

Abstract

The femto-second technology gains of increasing importance in industrial applications. In this context, a new generation of compact and low cost laser sources has to be provided on a commercial basis. Typical pulse durations of these sources are specified in the range from a few hundred femtoup to some pico-seconds, and typical wavelengths are centered around 1030-1080nm. As a consequence, also the demands imposed on high power optical components for these laser sources are rapidly increasing, especially in respect to their power handling capability in the ultra-short pulse range. The present contribution is dedicated to some aspects for improving this quality parameter of optical coatings. The study is based on a set of hafnia and silica mixtures with different compositions and optical band gaps. This material combination displays under ultra-short pulse laser irradiation effects, which are typically for thermal processes. For instance, melting had been observed in the morphology of damaged sides. In this context, models for a prediction of the laser damage thresholds and scaling laws are scrutinized, and have been modified calculating the energy of the electron ensemble. Furthermore, a simple first order approach for the calculation of the temperature was included.

Citation Download Citation

M. Jupé, M. Mende, C. Kolleck, D. Ristau, L. Gallais, and B. Mangote "Measurement and calculation of ternary oxide mixtures for thin films for ultra short pulse laser optics", Proc. SPIE 8190, Laser-Induced Damage in Optical Materials: 2011, 819004 (22 November 2011); https://doi.org/10.1117/12.899566

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