Characterization of 1064nm laser-induced damage on antireflection coatings grown by atomic layer deposition

Zhichao Liu; Yaowei Wei; Songlin Chen; Jin Luo; Ping Ma

doi:10.1117/12.899053

22 November 2011 Characterization of 1064nm laser-induced damage on antireflection coatings grown by atomic layer deposition

Zhichao Liu, Yaowei Wei, Songlin Chen, Jin Luo, Ping Ma

Author Affiliations +

Proceedings Volume 8190, Laser-Induced Damage in Optical Materials: 2011; 81900C (2011) https://doi.org/10.1117/12.899053
Event: SPIE Laser Damage, 2011, Boulder, Colorado, United States

Abstract

Damage tests were carried out to measure the laser resistance of Al₂O₃/TiO₂ and Al₂O₃/HfO₂ antireflection coatings at 1064nm grown by atomic layer deposition (ALD). The S-on-1 and R-on-1 damage results are given. It's interesting to find that ALD coatings damage performance seems closed to those grown by conventional e-beam evaporation process. For Al₂O₃/TiO₂ coatings, the grown temperature will impact the damage resistance of thin films. Crystallization of TiO₂ layer at higher temperature could play an importance role as absorption defects that reduced the LIDT of coatings. In addition, it is found that using inorganic compound instead of organic compound as precursors for ALD process can effective prevent residual carbon in films and will increase the LIDT of coatings.

Citation Download Citation

Zhichao Liu, Yaowei Wei, Songlin Chen, Jin Luo, and Ping Ma "Characterization of 1064nm laser-induced damage on antireflection coatings grown by atomic layer deposition", Proc. SPIE 8190, Laser-Induced Damage in Optical Materials: 2011, 81900C (22 November 2011); https://doi.org/10.1117/12.899053

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