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5 December 2011 Flat-field EUV spectrometer and its performance test by Penning discharge source
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Proceedings Volume 8197, 2011 International Conference on Optical Instruments and Technology: Optical Systems and Modern Optoelectronic Instruments; 81971A (2011) https://doi.org/10.1117/12.906583
Event: International Conference on Optical Instruments and Technology (OIT2011), 2011, Beijing, Beijing, China
Abstract
A high-resolution extreme ultraviolet (EUV) spectrometer is developed to diagnose the magnetically confined plasmas in the spectral region of 5-50 nm. The spectrometer consists a holographic aberration-corrected concave grating, an entrance slit, an x-ray shutter and a deep-cooled back-illuminated CCD camera. This paper presents the spectrometer structure, the spectral resolution simulation. The spectrometer is tested by a Penning discharge light source which is a convenient wavelength calibration source working at EUV spectral range. This light source emits a number of standard spectral lines with different combinations of discharge gas and cathode material, which will provide different standard spectral lines for wavelength calibration and spectral resolution evaluation. Results show that the spectral resolution is about 0.015 nm at 20 nm which agrees with the design goal.
© (2011) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Xuewei Du, Yuejiang Shi, Wei Zhang, Yongcai Shen, and Qiuping Wang "Flat-field EUV spectrometer and its performance test by Penning discharge source", Proc. SPIE 8197, 2011 International Conference on Optical Instruments and Technology: Optical Systems and Modern Optoelectronic Instruments, 81971A (5 December 2011); https://doi.org/10.1117/12.906583
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