A method of fabricating blazed grating by homogenous grating mask

Minghui Chen; Quan Liu; Jianhong Wu

doi:10.1117/12.907013

28 November 2011 A method of fabricating blazed grating by homogenous grating mask

Minghui Chen, Quan Liu, Jianhong Wu

Proceedings Volume 8202, 2011 International Conference on Optical Instruments and Technology: Solid State Lighting and Display Technologies, Holography, Speckle Pattern Interferometry, and Micro/Nano Manufacturing and Metrology; 820213 (2011) https://doi.org/10.1117/12.907013
Event: International Conference on Optical Instruments and Technology (OIT2011), 2011, Beijing, Beijing, China

Abstract

In this paper, a new approach has been proposed to fabricate holographic blazed grating. Firstly, a rectangular or trapezoidal grating is fabricated by the combination of photoresist ashing and reactive ion beam etching, and then blazed grating can be achieved by etching rectangular or trapezoidal grating. With this approach homogenous mask profile can be precisely controlled. The result we get by simulating the evolution of rectangular mask for ion beam milling with advanced segment motion algorithm which turns out to be similar with the experimental results. The blazed grating with a line density of 1200 lp/mm is fabricated by above method, and then the blaze angle and anti-blaze angle are measured by Scanning Electron Microscope (SEM). Obtained result shows that blazed grating has 7.1 degree blaze angle and about 22.5 degree anti-blaze angle.

Citation Download Citation

Minghui Chen, Quan Liu, and Jianhong Wu "A method of fabricating blazed grating by homogenous grating mask", Proc. SPIE 8202, 2011 International Conference on Optical Instruments and Technology: Solid State Lighting and Display Technologies, Holography, Speckle Pattern Interferometry, and Micro/Nano Manufacturing and Metrology, 820213 (28 November 2011); https://doi.org/10.1117/12.907013

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