Investigation of laser-induced damage threshold of hafnia/silica high reflectors at 1064 nm

Wanjun Ai; Shengming Xiong

doi:10.1117/12.910464

12 January 2012 Investigation of laser-induced damage threshold of hafnia/silica high reflectors at 1064 nm

Wanjun Ai, Shengming Xiong

Author Affiliations +

Proceedings Volume 8206, Pacific Rim Laser Damage 2011: Optical Materials for High Power Lasers; 82060G (2012) https://doi.org/10.1117/12.910464
Event: Pacific Rim Laser Damage Symposium: Optical Materials for High Power Lasers, 2011, Shanghai, China

Abstract

HfO₂ single layers and HfO₂/SiO₂ high reflectors with standard 1/4 wavelength design were prepared by ion assisted deposition (IAD) with APS ion source and ion beam sputtering (IBS). Characterization of HfO₂ single layers such as structural and optical properties, surface topography and absorption have been studied. The laser-induced damage thresholds (LIDTs) of the high reflectors with different multilayer stacks at 1064nm were tested with S-on-1 testing mode according to ISO-11254. In addition, optical properties, surface topography and absorption of these testing high reflectors have also been investigated in our experiments. All the results used to analyze the LIDTs of high reflectors have been discussed and interpreted in literature.

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Wanjun Ai and Shengming Xiong "Investigation of laser-induced damage threshold of hafnia/silica high reflectors at 1064 nm", Proc. SPIE 8206, Pacific Rim Laser Damage 2011: Optical Materials for High Power Lasers, 82060G (12 January 2012); https://doi.org/10.1117/12.910464

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