Research for ultra-short pulse ablation of dielectric film mirror

Zhimin Xiong; Panzheng Zhang; Youen Jiang; Xiaochao Wang; Dajie Huang; Wei Fan; Xuechun Li

doi:10.1117/12.910257

12 January 2012 Research for ultra-short pulse ablation of dielectric film mirror

Zhimin Xiong, Panzheng Zhang, Youen Jiang, Xiaochao Wang, Dajie Huang, Wei Fan, Xuechun Li

Proceedings Volume 8206, Pacific Rim Laser Damage 2011: Optical Materials for High Power Lasers; 82060V (2012) https://doi.org/10.1117/12.910257
Event: Pacific Rim Laser Damage Symposium: Optical Materials for High Power Lasers, 2011, Shanghai, China

Abstract

In high-power laser system, in order to extend the components' service life and reduce the operation costs, more attentions should be pay at the research for damages ablation at multi-layer optical components and other high load optical components. 240ps, 35ps, 6ps 1053nm laser pulses has been used to investigate damage ablation and damage resistant experiments at 0° high reflection films. By comparing the damage morphology and damage resistant threshold of the ablation pits at different pulses width, it was superior to use ultra-short pulse to repair multi-layers optical components. It was found that the shorter pulse width has been used, the higher the damage resistant threshold and the lower the laser modulation. Furthermore, the finite-difference time-domain method was used to simulate the electric-field intensification within the large size damage region of multilayer films.

Citation Download Citation

Zhimin Xiong, Panzheng Zhang, Youen Jiang, Xiaochao Wang, Dajie Huang, Wei Fan, and Xuechun Li "Research for ultra-short pulse ablation of dielectric film mirror", Proc. SPIE 8206, Pacific Rim Laser Damage 2011: Optical Materials for High Power Lasers, 82060V (12 January 2012); https://doi.org/10.1117/12.910257

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KEYWORDS

Laser ablation

Laser damage threshold

Dielectrics

Mirrors

Modulation

Pulsed laser operation

Multilayers

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