Microstructure Modeling: Scattering And Form Birefringence In Dielectric Thin Films

J. K. Moyle; W. J. Gunning III; W. H. Southwell

doi:10.1117/12.941853

2 February 1988 Microstructure Modeling: Scattering And Form Birefringence In Dielectric Thin Films

J. K. Moyle, W. J. Gunning III, W. H. Southwell

Proceedings Volume 0821, Modeling of Optical Thin Films; (1988) https://doi.org/10.1117/12.941853
Event: 31st Annual Technical Symposium on Optical and Optoelectronic Applied Sciences and Engineering, 1987, San Diego, CA, United States

Abstract

In-situ ellipsometry may be used to characterize thin films during growth. To interpret ellipsometric raw data, models must be assumed. The model for dielectrics is usually simple: a smooth, homogeneous, isotropic film of uniform thickness on a smooth substrate. This simple model causes index and thickness errors, especially in very thin films. More accurate models are required, and microstructure must be included in these models. Surface and bulk-like phenomena are caused by microstructure. As a result of surface roughness, light is scattered from the beam. At finite angles of incidence, s-polarized light is preferentially scattered. Furthermore, the microstructure breaks the film's inherent two-dimensional symmetry, and an isotropic bulk material becomes a birefringent thin film (form birefringence). Films with columnar microstructure on smooth substrates have been considered. As the films grow, the columnar microstructure develops. This leads to scattering and anisotropy in the films. Ellipsometer signals have been calculated using microstructure models. In CaF₂ films, form birefringence appears to be the dominant effect.

Citation Download Citation

J. K. Moyle, W. J. Gunning III, and W. H. Southwell "Microstructure Modeling: Scattering And Form Birefringence In Dielectric Thin Films", Proc. SPIE 0821, Modeling of Optical Thin Films, (2 February 1988); https://doi.org/10.1117/12.941853

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