Monolithic fabrication and performance control of multilayered, polarization sensitive, guided-mode resonance filters

Menelaos K. Poutous; Indumathi Raghu Srimathi; Eric G. Johnson

doi:10.1117/12.906854

8 February 2012 Monolithic fabrication and performance control of multilayered, polarization sensitive, guided-mode resonance filters

Menelaos K. Poutous, Indumathi Raghu Srimathi, Eric G. Johnson

Author Affiliations +

Proceedings Volume 8249, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics V; 82490D (2012) https://doi.org/10.1117/12.906854
Event: SPIE MOEMS-MEMS, 2012, San Francisco, California, United States

Abstract

An efficient monolithic fabrication technique of multiple Guided-Mode Resonance Filter (GMRF) devices on a single substrate is presented. The devices consist of two crossed linear sub-wavelength grating (SWG) dielectric layers, formed by etching deposited silicon oxide films, separated by a silicon nitride waveguide. The buried SWG duty cycle is lithographically modulated to control the device resonance wavelengths, independent of the top SWG. This is because the buried SWG acts as a tunable effective index layer, controlling the waveguide mode coupling wavelength into the silicon nitride waveguide layer. The two SWG have different spatial periods, to further reduce resonance coupling between them. The fabrication is accomplished using existing photolithographic technology, and conventional PECVD coating techniques.

Citation Download Citation

Menelaos K. Poutous, Indumathi Raghu Srimathi, and Eric G. Johnson "Monolithic fabrication and performance control of multilayered, polarization sensitive, guided-mode resonance filters", Proc. SPIE 8249, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics V, 82490D (8 February 2012); https://doi.org/10.1117/12.906854

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