Paper
23 February 2012 Optical waveguide end roughness in correlation to optical coupling
Author Affiliations +
Proceedings Volume 8267, Optoelectronic Interconnects XII; 82670N (2012) https://doi.org/10.1117/12.908847
Event: SPIE OPTO, 2012, San Francisco, California, United States
Abstract
With the ever-increasing demand for board-to-board optical data communications, the correlation between waveguide surface end roughness and coupling losses must be thoroughly investigated. This study measures end roughness of siloxane polymer optical waveguides in terms of optical coupling losses. Siloxane Polymers from Dow Corning were used to fabricate 50 x 50 μm rectangular waveguides through photolithographic processes. Edge roughness was controlled through various grades of fiber-optic polishing films and then measured using interferometric microscopy (IFM). Controlled lab results are compared with industrial polishing techniques that are consistent with mass-production methods. Electromagnetic modeling revealed correlations between experimental and theoretical results.
© (2012) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Kevin Kruse, Nick Riegel, Casey Demars, Christopher Middlebrook, and Michael Roggemann "Optical waveguide end roughness in correlation to optical coupling", Proc. SPIE 8267, Optoelectronic Interconnects XII, 82670N (23 February 2012); https://doi.org/10.1117/12.908847
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CITATIONS
Cited by 3 scholarly publications.
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KEYWORDS
Waveguides

Polishing

Optical simulations

Optical fibers

Optics manufacturing

Polymers

Multimode fibers

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