Translator Disclaimer
22 March 2012 Closing the infrastructure gap: status of the AIMS EUV project
Author Affiliations +
The EUV mask infrastructure is of key importance for a successful introduction of EUV lithography into volume production. In particular, for the production of defect free masks an actinic review of potential defect sites is required. With such a review it can be decided if a defect needs to be repaired or compensated. It also serves as verification whether the respective absorber or compensational repair with e.g. the MeRiT® tool has been successful, i.e. it closes the control loop in mask repair. To realize such an actinic review tool, Carl Zeiss and the SEMATECH EUVL Mask Infrastructure consortium started a development programme for an EUV aerial image metrology system (AIMS™ EUV). In this paper, we discuss the application of the AIMS™ EUV in the compensational repair process of multilayer and blank defects and present the status of the AIMS™ EUV project.
© (2012) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Dirk Hellweg, Markus Weiss, Sascha Perlitz, Jan Hendrik Peters, Wolfgang Harnisch, and Michael Goldstein "Closing the infrastructure gap: status of the AIMS EUV project", Proc. SPIE 8322, Extreme Ultraviolet (EUV) Lithography III, 83220L (22 March 2012);

Back to Top