Closing the infrastructure gap: status of the AIMS EUV project

Dirk Hellweg; Markus Weiss; Sascha Perlitz; Jan Hendrik Peters; Wolfgang Harnisch; Michael Goldstein

doi:10.1117/12.918691

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22 March 2012 Closing the infrastructure gap: status of the AIMS EUV project

Dirk Hellweg, Markus Weiss, Sascha Perlitz, Jan Hendrik Peters, Wolfgang Harnisch, Michael Goldstein

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Proceedings Volume 8322, Extreme Ultraviolet (EUV) Lithography III; 83220L (2012) https://doi.org/10.1117/12.918691
Event: SPIE Advanced Lithography, 2012, San Jose, California, United States

Abstract

The EUV mask infrastructure is of key importance for a successful introduction of EUV lithography into volume production. In particular, for the production of defect free masks an actinic review of potential defect sites is required. With such a review it can be decided if a defect needs to be repaired or compensated. It also serves as verification whether the respective absorber or compensational repair with e.g. the MeRiT® tool has been successful, i.e. it closes the control loop in mask repair. To realize such an actinic review tool, Carl Zeiss and the SEMATECH EUVL Mask Infrastructure consortium started a development programme for an EUV aerial image metrology system (AIMS™ EUV). In this paper, we discuss the application of the AIMS™ EUV in the compensational repair process of multilayer and blank defects and present the status of the AIMS™ EUV project.

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Dirk Hellweg, Markus Weiss, Sascha Perlitz, Jan Hendrik Peters, Wolfgang Harnisch, and Michael Goldstein "Closing the infrastructure gap: status of the AIMS EUV project", Proc. SPIE 8322, Extreme Ultraviolet (EUV) Lithography III, 83220L (22 March 2012); https://doi.org/10.1117/12.918691

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