From performance validation to volume introduction of ASML's NXE platform

Hans Meiling; Wim de Boeij; Frank Bornebroek; Noreen Harned; Ivo de Jong; Peter Kűrz; Martin Lowisch; Henk Meijer; David Ockwell; Rudy Peeters; Eelco van Setten; Judon Stoeldraijer; Christian Wagner; Stuart Young; Ron Kool

doi:10.1117/12.916971

23 March 2012 From performance validation to volume introduction of ASML's NXE platform

Hans Meiling, Wim de Boeij, Frank Bornebroek, Noreen Harned, Ivo de Jong, Peter Kűrz, Martin Lowisch, Henk Meijer, David Ockwell, Rudy Peeters, Eelco van Setten, Judon Stoeldraijer, Christian Wagner, Stuart Young, Ron Kool

Author Affiliations +

Proceedings Volume 8322, Extreme Ultraviolet (EUV) Lithography III; 83221G (2012) https://doi.org/10.1117/12.916971
Event: SPIE Advanced Lithography, 2012, San Jose, California, United States

Abstract

ASML's NXE platform is a multi-generation TWINSCAN™ platform using an exposure wavelength of 13.5nm, featuring a plasma source, all-reflective optics, and dual stages operating in vacuum. The NXE:3100 is the first product of this NXE platform. With a 0.25 NA projection optics, a planned throughput of 60 wafers/hr and dedicated chuck overlay of 4 nm, the NXE:3100 is targeted for extreme ultraviolet lithography (EUVL) implementation at 27nm halfpitch (hp) and below. The next generation NXE tools utilize a 0.33NA lens and include off-axis illumination for high volume manufacturing at a resolution down to 16nm hp and a targeted throughput of >100 wafers/hr. We share details of the performance of the 0.25NA lithography products in terms of imaging, overlay, throughput, and defectivity. We will show that we have met the required imaging performance associated with the 27nm hp node. We will also include a summary of the EUV source development, which is a key enabler for cost-effective introduction of EUVL into highvolume manufacturing. Finally, we will highlight some of the technical changes we introduced to enable the transition from 27 to 22nm lithographic performance while introducing our 0.33NA Step & Scan system, the NXE:3300B.

Citation Download Citation

Hans Meiling, Wim de Boeij, Frank Bornebroek, Noreen Harned, Ivo de Jong, Peter Kűrz, Martin Lowisch, Henk Meijer, David Ockwell, Rudy Peeters, Eelco van Setten, Judon Stoeldraijer, Christian Wagner, Stuart Young, and Ron Kool "From performance validation to volume introduction of ASML's NXE platform", Proc. SPIE 8322, Extreme Ultraviolet (EUV) Lithography III, 83221G (23 March 2012); https://doi.org/10.1117/12.916971

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available