Sub-atmospheric gas purification for EUVL vacuum environment control

Abneesh Srivastava; Stenio Pereira; Thomas Gaffney

doi:10.1117/12.916084

23 March 2012 Sub-atmospheric gas purification for EUVL vacuum environment control

Abneesh Srivastava, Stenio Pereira, Thomas Gaffney

Proceedings Volume 8322, Extreme Ultraviolet (EUV) Lithography III; 83222U (2012) https://doi.org/10.1117/12.916084
Event: SPIE Advanced Lithography, 2012, San Jose, California, United States

Abstract

High purity gas supply for optics purging and cleaning under vacuum is required to be maintained at the output of the mini-environment gas distribution box in EUV scanners. Typically H₂ gas is used for cleaning and purging while N₂ gas is used for purging H₂ lines post exposure. An investigation of gas purifier performance for moisture removal is made under sub-atmospheric pressure conditions. An evaluation of moisture levels as a function of switching between H₂ and N₂ gas supply states is also conducted. A superior performance (below instrument LDL) is observed for HX (Entegris, Inc.) gas purifier under various test conditions in the 10-100 kPa pressure range. Our preliminary studies provide a better understanding of gas purifier related moisture outgassing under vacuum and should facilitate better control and standardization of tool set-up parameters for environment in EUV lithography.

Citation Download Citation

Abneesh Srivastava, Stenio Pereira, and Thomas Gaffney "Sub-atmospheric gas purification for EUVL vacuum environment control", Proc. SPIE 8322, Extreme Ultraviolet (EUV) Lithography III, 83222U (23 March 2012); https://doi.org/10.1117/12.916084

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