Extension of PTB's EUV metrology facilities

Christian Laubis; Andreas Fischer; Frank Scholze

doi:10.1117/12.916414

23 March 2012 Extension of PTB's EUV metrology facilities

Christian Laubis, Andreas Fischer, Frank Scholze

Proceedings Volume 8322, Extreme Ultraviolet (EUV) Lithography III; 832236 (2012) https://doi.org/10.1117/12.916414
Event: SPIE Advanced Lithography, 2012, San Jose, California, United States

Abstract

After developing metrology with synchrotron radiation in its laboratories at the electron storage rings BESSY I and BESSY II for almost 30 years, PTB is extending its capabilities for EUV metrology with the EUV beamline at the Metrology Light Source. With the new instrumentation, PTB is prepared for the metrological challenges when EUV lithography changes over from R&D to pilot production. PTB's EUV reflectometer for large optical components, e.g. collector mirrors for LPP sources, will be transferred to this new dedicated EUV beamline. This allows us to offer services to customers independent of the operating schedule of BESSY - a basic research facility with regular shut-down times. The new beamline also provides much higher radiant power in the EUV spectral range up to 50 nm wavelength. This will particularly benefit the characterization of sensors regarding responsivity and stability, and the characterization of EUV components in the out-of-band spectral range. Reliable detector characterization is the basis for source power meters or tool-internal sensors. We present an updated overview of our new metrological capabilities with recent measurement examples.

Citation Download Citation

Christian Laubis, Andreas Fischer, and Frank Scholze "Extension of PTB's EUV metrology facilities", Proc. SPIE 8322, Extreme Ultraviolet (EUV) Lithography III, 832236 (23 March 2012); https://doi.org/10.1117/12.916414

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