Design of a high positioning contact probe for plasmonic lithography

Jinhee Jang; Yongwoo Kim; Seok Kim; Howon Jung; Jae Won Hahn

doi:10.1117/12.916274

21 March 2012 Design of a high positioning contact probe for plasmonic lithography

Jinhee Jang, Yongwoo Kim, Seok Kim, Howon Jung, Jae Won Hahn

Proceedings Volume 8323, Alternative Lithographic Technologies IV; 832322 (2012) https://doi.org/10.1117/12.916274
Event: SPIE Advanced Lithography, 2012, San Jose, California, United States

Abstract

We suggest a geometrically modified probe to achieve high positioning accuracy for plasmonic lithography which can record nanometer scale features and has high throughput. Instead of a cantilever probe, we propose a circular probe which has arc-shaped arms that hold the tip at the center. The modified probe is based on the fixed-fixed beam in material mechanics. To calculate the tip displacement, we used a finite element method (FEM) for a circular probe and compared the results with cantilever probe. We considered a silicon-based micro-fabrication process to design the probe. The probe has a square outline boundary with a length of 50μm, four arms, and a pyramidal tip with a height of 5μm. The ratio of the lateral tip displacement to the vertical deflection was evaluated to indicate the positioning accuracy. The probe has higher accuracy by a factor of 10³ and 10 in approach mode and scan mode, respectively, compared to a cantilever probe. We expect that a circular probe is appropriate for the applications that require high positioning accuracy, such as nanolithography with a contact probe and multiple-probe arrays.

Citation Download Citation

Jinhee Jang, Yongwoo Kim, Seok Kim, Howon Jung, and Jae Won Hahn "Design of a high positioning contact probe for plasmonic lithography", Proc. SPIE 8323, Alternative Lithographic Technologies IV, 832322 (21 March 2012); https://doi.org/10.1117/12.916274

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