Paper
3 April 2012 Characterization of ultrathin films by laser-induced sub-picosecond photoacoustics with coherent extreme ultraviolet detection
Qing Li, Kathleen Hoogeboom-Pot, Damiano Nardi, Chris Deeb, Sean King, Marie Tripp, Erik Anderson, Margaret M. Murnane, Henry C. Kapteyn
Author Affiliations +
Abstract
Photoacoustic spectroscopy is a powerful tool for characterizing thin films. In this paper we demonstrate a new photoacoustic technique that allows us to precisely characterize the mechanical properties of ultrathin films. We focus an ultrafast laser onto a nano-patterned thin film sample, launching both surface acoustic waves (SAWs) and longitudinal acoustic waves (LAWs). Coherent extreme ultraviolet pulses are then used to probe the propagation dynamics of both the SAWs and LAWs. The resulting photoacoustic signal on both short (picosecond) and long (nanosecond) time scales yields important information. In the first 100ps, a fast oscillation followed by an echo signal corresponds to LAWs traveling inside the nanostructures and the thin film, from which the LAW velocities in the two materials can be extracted. On longer time-scales, SAW oscillations are observed. By combining the measured SAW frequency with the wavelength (determined by the nanostructure period) the SAW velocity can be accurately determined, even for very short wavelength surface acoustic waves with very small penetration depths. Using this technique, the elastic properties, including the Young's modulus and Poisson ratio for the thin film, can be obtained in a single measurement, this technique can be extended to sub-10nm thin films.
© (2012) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Qing Li, Kathleen Hoogeboom-Pot, Damiano Nardi, Chris Deeb, Sean King, Marie Tripp, Erik Anderson, Margaret M. Murnane, and Henry C. Kapteyn "Characterization of ultrathin films by laser-induced sub-picosecond photoacoustics with coherent extreme ultraviolet detection", Proc. SPIE 8324, Metrology, Inspection, and Process Control for Microlithography XXVI, 83241P (3 April 2012); https://doi.org/10.1117/12.916866
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CITATIONS
Cited by 4 scholarly publications.
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KEYWORDS
Thin films

Acoustics

Photoacoustic spectroscopy

Extreme ultraviolet

Nanostructures

Nickel

Silicon

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