Theoretical study on structural effects of polymer ionization for EUV resist

M. Endo; S. Tagawa

doi:10.1117/12.915696

19 March 2012 Theoretical study on structural effects of polymer ionization for EUV resist

M. Endo, S. Tagawa

Proceedings Volume 8325, Advances in Resist Materials and Processing Technology XXIX; 83251F (2012) https://doi.org/10.1117/12.915696
Event: SPIE Advanced Lithography, 2012, San Jose, California, United States

Abstract

We studied the ionization of polymer for extreme ultraviolet (EUV) resist. Quantum chemical calculation was performed. Upon EUV exposure to the polymer in a resist, the ionization of the polymer occurs and the secondary electrons generate. As the secondary electrons from the polymer cause the reaction of photoacid generator and the photoacid generates, the ionization of the polymer is a key for the sensitivity of resist for EUV. In this paper, the structural effects of polymer ionization was investigated. The acryl polymers with various pendant groups were compared. It was found that the stable condition of radical cation helps the ionization of the polymer.

Citation Download Citation

M. Endo and S. Tagawa "Theoretical study on structural effects of polymer ionization for EUV resist", Proc. SPIE 8325, Advances in Resist Materials and Processing Technology XXIX, 83251F (19 March 2012); https://doi.org/10.1117/12.915696

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