Synthesis and photopolymerization kinetics of a novel oxime ester sulfonic acid photoacid generator

Yu-Lian Pang; Ying-Quan Zou

doi:10.1117/12.916239

20 March 2012 Synthesis and photopolymerization kinetics of a novel oxime ester sulfonic acid photoacid generator

Yu-Lian Pang, Ying-Quan Zou

Proceedings Volume 8325, Advances in Resist Materials and Processing Technology XXIX; 83251Q (2012) https://doi.org/10.1117/12.916239
Event: SPIE Advanced Lithography, 2012, San Jose, California, United States

Abstract

On the basis of the chemical structure of (5-Hydroxyimino-5H-thiophen-2-ylidene)-phenylacetonitrile, we synthesized a novel sulfonic oxime ester photoacid generator named (5-Ptoluenesulfonyloxyimino- 5H-thiophen-2-ylidene)-phenyl-acetonitrile (TTPA),which was an efficient Photoacid generator (PAG) for 405nm violet laser imaging system.It was synthesized from 2- Nitrothiophen ,Phenylqceto-nitrile and P-toluenesulfonyl chloride.TTPA was characterized by FTIR¹HNMR and UV absorption spectra. Real time infrared spectroscopy(RTIR) was used to investigate the effect of different monomers system and different concentrations of TTPA on the polymerization kinetics. The results showed that with the concentration of TTPA increase, with limits, the rate of photopolymerization(Rp) and final double bond conversion increased and the induction period shortened.

Citation Download Citation

Yu-Lian Pang and Ying-Quan Zou "Synthesis and photopolymerization kinetics of a novel oxime ester sulfonic acid photoacid generator", Proc. SPIE 8325, Advances in Resist Materials and Processing Technology XXIX, 83251Q (20 March 2012); https://doi.org/10.1117/12.916239

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