Solvent pre-wetting as an effective start-up method for point-of-use filter

Toru Umeda; Shinichi Sugiyama; Takashi Nakamura; Makoto Momota; Michael Sevegney; Shuichi Tsuzuki; Toru Numaguchi

doi:10.1117/12.916026

19 March 2012 Solvent pre-wetting as an effective start-up method for point-of-use filter

Toru Umeda, Shinichi Sugiyama, Takashi Nakamura, Makoto Momota, Michael Sevegney, Shuichi Tsuzuki, Toru Numaguchi

Proceedings Volume 8325, Advances in Resist Materials and Processing Technology XXIX; 83252H (2012) https://doi.org/10.1117/12.916026
Event: SPIE Advanced Lithography, 2012, San Jose, California, United States

Abstract

An effective filter start-up method has been required by device manufacturers, mainly in order to reduce waste volume of lithography process chemicals, which become more expensive as lithography technology advances. Remaining air was monitored during static-pressure-driven filter start-up. As a result, 3500 ml of the resist was needed to eliminate remaining air. For improvement, cyclohexanone pre-wetting was applied prior to the resist introduction. As a result, the resist volume needed for the solvent displacement was 1900 ml, approximately half the volume required for staticpressure- driven start-up. Other solvents were evaluated for the pre-wetting start-up method. Results, in descending order of performance were PGME (best) < PGMEA = IPA < cyclohexanone (worst). Moreover, air displacement performance strongly correlated with Hansen solubility parameter distance between each solvent and nylon 6,6 material.

Citation Download Citation

Toru Umeda, Shinichi Sugiyama, Takashi Nakamura, Makoto Momota, Michael Sevegney, Shuichi Tsuzuki, and Toru Numaguchi "Solvent pre-wetting as an effective start-up method for point-of-use filter", Proc. SPIE 8325, Advances in Resist Materials and Processing Technology XXIX, 83252H (19 March 2012); https://doi.org/10.1117/12.916026

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