Overlay metrology for low-k1: challenges and solutions

Jens Timo Neumann; Jongsu Lee; Kiho Yang; Byounghoon Lee; Taehyeong Lee; Jeongsu Park; Chang-moon Lim; Donggyu Yim; Sungki Park; Eric Janda; Kaustuve Bhattacharyya; Chan-ho Ryu; Young-Hong Min; Kiki Rhe; Bernd Geh

doi:10.1117/12.916376

13 March 2012 Overlay metrology for low-k₁: challenges and solutions

Jens Timo Neumann, Jongsu Lee, Kiho Yang, Byounghoon Lee, Taehyeong Lee, Jeongsu Park, Chang-moon Lim, Donggyu Yim, Sungki Park, Eric Janda, Kaustuve Bhattacharyya, Chan-ho Ryu, Young-Hong Min, Kiki Rhe, Bernd Geh

Author Affiliations +

Proceedings Volume 8326, Optical Microlithography XXV; 832602 (2012) https://doi.org/10.1117/12.916376
Event: SPIE Advanced Lithography, 2012, San Jose, California, United States

Abstract

Typical overlay metrology marks like Box-in-Box or Advanced-Imaging-Marks print surprisingly poor when exposed with extreme off-axis-illumination. This paper analyzes the root-cause for this behavior and establishes a method how to understand and predict the results of overlay metrology on resist. A simulation flow is presented which covers the lithographic exposure as well as the actual inspection of the resist profiles. This flow is then used to study the impact of scanner/process imperfections on the overlay measurements; both image-based and diffraction-based overlay metrology are covered. This helps to gain a deeper understanding of the critical parameters in the printing and inspection of overlay marks, and eventually develop and assess mark enhancement strategies for image-based overlay metrology such as chopping, or assess the benefit of diffraction-based overlay metrology. In parallel to the simulations, results of wafer exposures are presented which investigate various aspects of overlay metrology and validate our simulations.

Citation Download Citation

Jens Timo Neumann, Jongsu Lee, Kiho Yang, Byounghoon Lee, Taehyeong Lee, Jeongsu Park, Chang-moon Lim, Donggyu Yim, Sungki Park, Eric Janda, Kaustuve Bhattacharyya, Chan-ho Ryu, Young-Hong Min, Kiki Rhe, and Bernd Geh "Overlay metrology for low-k₁: challenges and solutions", Proc. SPIE 8326, Optical Microlithography XXV, 832602 (13 March 2012); https://doi.org/10.1117/12.916376

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