Computational lithography work flows and design rule exploration automation

S. Sethi; William Stanton; Kevin Lucas; Jay Hiserote; Duck-Hyung Hur; Rooli Choi

doi:10.1117/12.918057

14 March 2012 Computational lithography work flows and design rule exploration automation

S. Sethi, William Stanton, Kevin Lucas, Jay Hiserote, Duck-Hyung Hur, Rooli Choi

Proceedings Volume 8327, Design for Manufacturability through Design-Process Integration VI; 83270O (2012) https://doi.org/10.1117/12.918057
Event: SPIE Advanced Lithography, 2012, San Jose, California, United States

Abstract

Lithography development has become extremely computationally intensive. For a particular technology node being developed, it is critical to determine the optimum source and OPC/RET for each layer. In this paper we present a flexible new computation system for automation of source, OPC and RET optimization of advanced lithography layers. Of course, before determining the optimum source/RET/OPC of any layer, it is equally critical to determine the design rules which can be manufactured at a particular technology node. The design rule computational lithography problem is a superset of the source/OPC/RET optimization problem. With an automated methodology, time for process development can be reduced dramatically if a process development engineer can determine the design rules through accurate, automated simulation of the entire flow.

Citation Download Citation

S. Sethi, William Stanton, Kevin Lucas, Jay Hiserote, Duck-Hyung Hur, and Rooli Choi "Computational lithography work flows and design rule exploration automation", Proc. SPIE 8327, Design for Manufacturability through Design-Process Integration VI, 83270O (14 March 2012); https://doi.org/10.1117/12.918057

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members: $17.00

Non-members: $21.00 ADD TO CART

PROCEEDINGS
13 PAGES

DOWNLOAD PAPER SAVE TO MY LIBRARY

GET CITATION

RIGHTS & PERMISSIONS

Get copyright permission Get copyright permission on Copyright Marketplace

KEYWORDS

Source mask optimization

Optical proximity correction

Optimization (mathematics)

Computational lithography

Atrial fibrillation

Resolution enhancement technologies

Lithography

Show All Keywords

Keywords/Phrases

Search In:

Publication Years