A scoring methodology for quantitatively evaluating the quality of double patterning technology-compliant layouts

Lynn T.-N. Wang; Sriram Madhavan; Shobhit Malik; Piyush Pathak; Luigi Capodieci

doi:10.1117/12.916494

14 March 2012 A scoring methodology for quantitatively evaluating the quality of double patterning technology-compliant layouts

Lynn T.-N. Wang, Sriram Madhavan, Shobhit Malik, Piyush Pathak, Luigi Capodieci

Author Affiliations +

Proceedings Volume 8327, Design for Manufacturability through Design-Process Integration VI; 832718 (2012) https://doi.org/10.1117/12.916494
Event: SPIE Advanced Lithography, 2012, San Jose, California, United States

Abstract

A Double Patterning Technology (DPT)-aware scoring methodology that systematically quantifies the quality of DPTcompliant layout designs is described. The methodology evaluates layouts based on a set of DPT-specific metrics that characterizes layout-induced process variation. Specific metrics include: the spacing variability between two adjacent oppositely-colored features, the density differences between the two exposure masks, and the stitching area's sensitivity to mask misalignment. These metrics are abstracted to a scoring scale from 0 to 1 such that 1 is the optimum. This methodology provides guidance for opportunistic layout modifications so that DPT manufacturability-related issues are mitigated earlier in design. Results show that by using this methodology, a DPT-compliant layout improved from a composite score of 0.66 and 0.78 by merely changing the decomposition solution so that the density distribution between the two exposure masks is relatively equal.

Citation Download Citation

Lynn T.-N. Wang, Sriram Madhavan, Shobhit Malik, Piyush Pathak, and Luigi Capodieci "A scoring methodology for quantitatively evaluating the quality of double patterning technology-compliant layouts", Proc. SPIE 8327, Design for Manufacturability through Design-Process Integration VI, 832718 (14 March 2012); https://doi.org/10.1117/12.916494

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