Ion energy spectrum and magnetic foil trap debris mitigation efficiency of the laser produced plasma sources for extreme ultraviolet lithography

Tao Wu; Shifang Wang; Zhiming Rao

doi:10.1117/12.918317

13 March 2012 Ion energy spectrum and magnetic foil trap debris mitigation efficiency of the laser produced plasma sources for extreme ultraviolet lithography

Tao Wu, Shifang Wang, Zhiming Rao

Author Affiliations +

Proceedings Volume 8330, Photonics and Optoelectronics Meetings (POEM) 2011: Laser and Terahertz Science and Technology; 83300O (2012) https://doi.org/10.1117/12.918317
Event: Photonics and Optoelectronics Meetings 2011, 2011, Wuhan, China

Abstract

Based on the energy spectrum and maximum kinetic energy of accelerated ions, an analytical model was developed to calculate the magnetic foil trap mitigation efficiency of ion debris emitted from droplet-based laser-produced mass-limited plasmas for an application to extreme ultraviolet (EUV) lithography. The effects of magnetic field intensity, foil structures on the mitigation efficiency of different ionization state ions were investigated in order to establish the guideline for the optimum design of a mitigation system. The calculation results show that the foil trap mitigation efficiency η is calculated in the range of 92%~78% for a foil angle of 0.03 rad and foil length of 10 cm under magnetic field of B=0.1 T, which for the case of laser power densities and droplet target radius in the range suitable for extreme ultraviolet light source for lithography.

Citation Download Citation

Tao Wu, Shifang Wang, and Zhiming Rao "Ion energy spectrum and magnetic foil trap debris mitigation efficiency of the laser produced plasma sources for extreme ultraviolet lithography", Proc. SPIE 8330, Photonics and Optoelectronics Meetings (POEM) 2011: Laser and Terahertz Science and Technology, 83300O (13 March 2012); https://doi.org/10.1117/12.918317

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