Paper
16 April 2012 Nanoimprint activities in Austria in the research project cluster NILaustria
Michael Mühlberger, Hannes Fachberger, Iris Bergmair, Michael Rohn, Bernd Dittert, Rainer Schöftner, Thomas Rothländer, Dieter Nees, Ursula Palfinger, Anja Haase, Alexander Fian, Martin Knapp, Claudia Preininger, Gerald Kreindl, Michael Kast, Thomas Fromherz
Author Affiliations +
Proceedings Volume 8352, 28th European Mask and Lithography Conference; 83520O (2012) https://doi.org/10.1117/12.921324
Event: 28th European Mask and Lithography Conference (EMLC 2012), 2012, Dresden, Germany
Abstract
The NILaustria research project cluster consists of 8 individual research projects and aims to improve nanoimprint lithography in an application driven approach. The cluster is presented as well as highlights from the projects, e.g. the replication of 12.5nm half pitch features using working stamp copies, topics from organic electronics, metamaterials and SiGe technology. An outlook on the new activities is given.
© (2012) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Michael Mühlberger, Hannes Fachberger, Iris Bergmair, Michael Rohn, Bernd Dittert, Rainer Schöftner, Thomas Rothländer, Dieter Nees, Ursula Palfinger, Anja Haase, Alexander Fian, Martin Knapp, Claudia Preininger, Gerald Kreindl, Michael Kast, and Thomas Fromherz "Nanoimprint activities in Austria in the research project cluster NILaustria", Proc. SPIE 8352, 28th European Mask and Lithography Conference, 83520O (16 April 2012); https://doi.org/10.1117/12.921324
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Nanoimprint lithography

Nanolithography

Nanostructures

Organic electronics

Transistors

Nanostructuring

Electrodes

Back to Top