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7 May 2012 Bragg reflectors for large optical aperture MEMS Fabry-Perot interferometers
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Abstract
This paper presents the fabrication of large-aperture low-pressure chemical-vapour deposited (LPCVD) Bragg reflectors utilizing low-stress polysilicon (PolySi) and silicon-rich silicon nitride (SiN) λ/4-thin film stacks. These structures can function as the upper mirror in a MEMS FPI device. High aspect-ratio mirror membranes were successfully released for 5 - 10 mm diameter range by sacrificial SiO2 etching in HF vapour. Optical simulations are presented for the Bragg reflector test structures designed for FPIs operating in the NIR range and the properties such as release yield and mechanical stability of the released LPCVD deposited polySi-SiN mirror membranes are compared with similar released atomic layer deposited (ALD) Al2O3-TiO2 λ/4-thin film mirror stacks. The realization of these Bragg reflector structures is the first step in the process integration of large-aperture MEMS FPI for miniature NIR imaging spectrometers, which can be applied to a variety of applications ranging from medical imaging and diagnostics to spaceand environmental monitoring instrumentation.
© (2012) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Anna Rissanen, Rami Mannila, and Jarkko Antila "Bragg reflectors for large optical aperture MEMS Fabry-Perot interferometers", Proc. SPIE 8373, Micro- and Nanotechnology Sensors, Systems, and Applications IV, 83732R (7 May 2012); https://doi.org/10.1117/12.920578
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