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7 May 2012Bragg reflectors for large optical aperture MEMS Fabry-Perot interferometers
This paper presents the fabrication of large-aperture low-pressure chemical-vapour deposited (LPCVD) Bragg reflectors
utilizing low-stress polysilicon (PolySi) and silicon-rich silicon nitride (SiN) λ/4-thin film stacks. These structures can
function as the upper mirror in a MEMS FPI device. High aspect-ratio mirror membranes were successfully released for
5 - 10 mm diameter range by sacrificial SiO2 etching in HF vapour. Optical simulations are presented for the Bragg
reflector test structures designed for FPIs operating in the NIR range and the properties such as release yield and
mechanical stability of the released LPCVD deposited polySi-SiN mirror membranes are compared with similar released
atomic layer deposited (ALD) Al2O3-TiO2 λ/4-thin film mirror stacks. The realization of these Bragg reflector
structures is the first step in the process integration of large-aperture MEMS FPI for miniature NIR imaging
spectrometers, which can be applied to a variety of applications ranging from medical imaging and diagnostics to spaceand
environmental monitoring instrumentation.
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Anna Rissanen, Rami Mannila, Jarkko Antila, "Bragg reflectors for large optical aperture MEMS Fabry-Perot interferometers," Proc. SPIE 8373, Micro- and Nanotechnology Sensors, Systems, and Applications IV, 83732R (7 May 2012); https://doi.org/10.1117/12.920578