Ptychography applied to optical metrology

Daniel Claus; David J. Robinson; Derek G. Chetwynd; Shuo Yang; W. Thomas Pike; John M. Rodenburg

doi:10.1117/12.977959

11 September 2012 Ptychography applied to optical metrology

Daniel Claus, David J. Robinson, Derek G. Chetwynd, Shuo Yang, W. Thomas Pike, John M. Rodenburg

Proceedings Volume 8413, Speckle 2012: V International Conference on Speckle Metrology; 84130O (2012) https://doi.org/10.1117/12.977959
Event: SPECKLE 2012: V International Conference on Speckle Metrology, 2012, Vigo, Spain

Abstract

This paper introduces ptychography, a novel and very exciting phase retrieval technique, to the field of optical metrology. Its working principle is explained and a useful application in combination with the dual wavelength method for topography measurement is presented. Advantages of the dual wavelength method compared to other optical topography measurement techniques, the experimental procedure and the analysis of the data are discussed.

Citation Download Citation

Daniel Claus, David J. Robinson, Derek G. Chetwynd, Shuo Yang, W. Thomas Pike, and John M. Rodenburg "Ptychography applied to optical metrology", Proc. SPIE 8413, Speckle 2012: V International Conference on Speckle Metrology, 84130O (11 September 2012); https://doi.org/10.1117/12.977959

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