Thin-film thickness measurement method based on the reflection interference spectrum

Li Na Jiang; Gao Feng; Zhang Shu

doi:10.1117/12.961242

15 October 2012 Thin-film thickness measurement method based on the reflection interference spectrum

Li Na Jiang, Gao Feng, Zhang Shu

Proceedings Volume 8415, 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Large Mirrors and Telescopes; 84150P (2012) https://doi.org/10.1117/12.961242
Event: 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies (AOMATT 2012), 2012, Xiamen, China

Abstract

A method is introduced to measure the thin-film thickness, refractive index and other optical constants. When a beam of white light shines on the surface of the sample film, the reflected lights of the upper and the lower surface of the thin-film will interfere with each other and reflectivity of the film will fluctuate with light wavelength. The reflection interference spectrum is analyzed with software according to the database, while the thickness and refractive index of the thin-film is measured.

Citation Download Citation

Li Na Jiang, Gao Feng, and Zhang Shu "Thin-film thickness measurement method based on the reflection interference spectrum", Proc. SPIE 8415, 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Large Mirrors and Telescopes, 84150P (15 October 2012); https://doi.org/10.1117/12.961242

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