Evolution and control of optical thin film stress

Ming Fang; JingPing Li; HongBo He; Zhengxiu Fan; Qilin Xiao; ZhaoYang Li

doi:10.1117/12.2009292

16 October 2012 Evolution and control of optical thin film stress

Ming Fang, JingPing Li, HongBo He, Zhengxiu Fan, Qilin Xiao, ZhaoYang Li

Proceedings Volume 8416, 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies; 84160K (2012) https://doi.org/10.1117/12.2009292
Event: 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies (AOMATT 2012), 2012, Xiamen, China

Abstract

Fine control of Optical Thin Film Stress is critical to develop an expected profile parameters of large aperture coated optics. In our latest effort, the evolution of stress and force per unit width of multilayer thin film formulas, (H2L)⁶, (H2L)⁵H and (HL)⁷, consisted of HfO₂ and SiO₂ were researched. The stresses of SiO₂ single layers deposited on the HfO₂ were small than those grew on glass and get smaller as the multilayer thin film deposited. While the stresses of HfO₂ films deposited on the SiO₂ were positive correlation with the stress of SiO₂.

Citation Download Citation

Ming Fang, JingPing Li, HongBo He, Zhengxiu Fan, Qilin Xiao, and ZhaoYang Li "Evolution and control of optical thin film stress", Proc. SPIE 8416, 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 84160K (16 October 2012); https://doi.org/10.1117/12.2009292

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