Aging effect of optical properties on SiO2 films grown on Si substrates by ion beam sputtering

Yiqin Ji; Huasong Liu; Yugang Jiang; Dandan Liu; Lishuan Wang; Chenghui Jiang; Rongwei Fan; Deying Chen

doi:10.1117/12.975934

16 October 2012 Aging effect of optical properties on SiO₂ films grown on Si substrates by ion beam sputtering

Yiqin Ji, Huasong Liu, Yugang Jiang, Dandan Liu, Lishuan Wang, Chenghui Jiang, Rongwei Fan, Deying Chen

Proceedings Volume 8416, 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies; 84161F (2012) https://doi.org/10.1117/12.975934
Event: 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies (AOMATT 2012), 2012, Xiamen, China

Abstract

SiO₂ is a very important low refractive index material and usually used in combination with high refractive index material to manufacture the coatings with low optical loss. In this paper, SiO₂ films were deposited on Si substrates by an ion beam sputtering (IBS) technique and SiO2 target with purity of 99.99% was used as SiO₂ thin films forming material. The thickness of SiO₂ films grown onto Si substrates are about 900 nm. Aging optical properties of SiO₂ films were investigated as a function of time placed in the air. Spectroscopic ellipsometry was used to measure optical constants of SiO₂ films. The refractive index of SiO₂ films change with the increase of placed time. When the placed time reaches more than 200 days, the value of refractive index tends to be constant and the corresponding variation rate is about 0.5%. As the placed time increases, the physical thickness and optical thickness also drive to be stabilization. It can be seen that optical properties of SiO₂ films prepared by IBS technique under some process parameters are very stability.

Citation Download Citation

Yiqin Ji, Huasong Liu, Yugang Jiang, Dandan Liu, Lishuan Wang, Chenghui Jiang, Rongwei Fan, and Deying Chen "Aging effect of optical properties on SiO₂ films grown on Si substrates by ion beam sputtering", Proc. SPIE 8416, 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 84161F (16 October 2012); https://doi.org/10.1117/12.975934

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